 Origin |
Korea |
Products
- Ceria Slurry(CeO2)
- Al2O3 Slurry
- ZrO2 Slurry
Description
As Feature Size continues to shrink for leading edge IC Devices CMP has become a critical process demanding advanced Slurry materials ensuring reliability & the highest level of performance.
ANP has developed Performance Engineered Nano Ceria to provide high selectivity, high oxide removal rate, and ultra-low defectivity with good stability for STI & ILD CMP Applications
CMP Applications
- STI ( Shadow Trench Isolation )
- High Rate Oxide ILD
- Metal CMP
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